The epitaxial graphene furnace is a customized graphite hot-zone furnace with the capability to be heated up to 2500 ?. The work zone in the chamber is 4Ø×6h (inch), enabling to grow samples with different sizes from 5 mm square to 4 inch wafer in different customized crucibles. The chamber exhaust includes a rotary vane pump and diffusion pump, allowing the ultimate vacuum in the chamber to reach 10^-6 Torr at room temperature.  With the home-built gaslines and pressure controlling system, argon as carrier gas and H₂ & CH₄ as precursors are introduced into the system. The operation pressure in the chamber ranges form 1 to 1000 Torr.