The Alcatel "Speeder 100SiO₂" is an ICP Etching system which is configured for etch silicon using either the patented BOSCH Deep Silicon Etch Process or a Cryogenic etch process that are typically used in MEMS (Micro-ElectroMechanical Systems), microfluidics, and silicon masters for soft lithography stamps. The system is setup to process 4" wafers and uses etch masks of either photo resist or thermal oxide. The system also has both the LF and HF options for controlling the footing at the bottom of etched features.